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  • Scratch Behavior of ZrO2 Thin Film Prepared by Atomic Layer Deposition Method on Si Wafer
    42
    Scratch Behavior of ZrO2 Thin Film Prepared by Atomic Layer Deposition Method on Si Wafer
    Journal of Friction and Wear, Vol 38, No. 6, pp. 469-476 (2017) (SCIE, IF: 0.514)
    S. H. Kim B. C. Yang J. An H. S. Ahn
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  • Enhanced Thermal Stability of a Gadolinia-doped Ceria Capped Metal Electrode for Durable Low-Temperature Solid Oxide Fuel Cells
    41
    Enhanced Thermal Stability of a Gadolinia-doped Ceria Capped Metal Electrode for Durable Low-Temperature Solid Oxide Fuel Cells
    J. Electrochem. Soc., Vol. 164, pp. F1301-F1306, Sep. 2017 (DOI: 10.1149/2.0261713jes)(SCI(top 10%), IF: 3.259) (Collaboration w/ Hanyang univ. (Korea))
    S. Hong S. Oh H. J. Kim Y. Lim J. An Y.B. Kim
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  • Ultraviolet light-induced wettability control of ultrathin atomic layer deposited TiO2 film surface
    40
    Ultraviolet light-induced wettability control of ultrathin atomic layer deposited TiO2 film surface
    Thin Solid Films, Vol. 642, pp.151-156, Nov. 2017 (DOI:10.1016/j.tsf.2017.09.028) (SCI, IF: 1.879)(*corresponding author)
    Y. Jang B. Yang J. Shin J. An*
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  • Ridge-Valley Nanostructured SDC Interlayer for Thermally Stable Cathode Interface in Low-Temperature SOFC
    39
    Ridge-Valley Nanostructured SDC Interlayer for Thermally Stable Cathode Interface in Low-Temperature SOFC
    Phys. Status Solidi A, Vol. 214, p. 1700465, Aug. 2017(DOI: 10.1002/pssa.201700465) (SCI, IF: 1.775)(*corresponding author)(Collaboration w/ Hanyang univ. (Korea))
    H. J. Kim J. G. Yu S.W. Hong C. H. Park Y. B. Kim J. An*
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  • Process-property relation in high-k ALD perovskite oxides: A review
    38
    Process-property relation in high-k ALD perovskite oxides: A review
    J. Mater. Chem. C, Vol. 5, pp. 8000-8013, Jun. 2017 (SCI, IF: 5.256)(*corresponding authors)(Collaboration w/ Korea univ. (Korea), UC Merced (US) and Stanford univ. (US))
    J. H. Shim* H. J. Choi Y. Kim J Torgersen J. An* M. Lee F.B. Prinz*
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  • Low thermal conductivity of atomic layer deposition yttria-stabilized zirconia (YSZ) thin films for thermal insulation applications
    37
    Low thermal conductivity of atomic layer deposition yttria-stabilized zirconia (YSZ) thin films for thermal insulation applications
    Journal of European Ceramics Society, Vol. 37(9), pp. 3131-3136, Aug. 2017 (SCI(top 10%), IF: 3.454)(*corresponding authors) (Collaboration w/ Kyunghee univ. (Korea) and Stanford univ. (US))
    J. Cho J. Park J. An*
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  • Enhancing thermal-stability of metal electrodes with a sputtered gadolinia-doped ceria over-layer for low-temperature solid oxide fuel cells
    36
    Enhancing thermal-stability of metal electrodes with a sputtered gadolinia-doped ceria over-layer for low-temperature solid oxide fuel cells
    Ceramics International, Vol. 43, pp.5781–5788, May 2017 (SCI(top 10%), IF:2.986 )(*corresponding authors)(Collaboration w/ Hanyang univ. (Korea))
    S. Oh S. Hong H. J. Kim Y. B. Kim* J. An*
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  • 기본썸네일이미지
    35
    Bimetallic Nickel/Ruthenium Catalysts Synthesized by Atomic Layer Deposition for Low-Temperature Direct Methanol Solid Oxide Fuel Cells
    ACS Appl. Mater. Inter., Vol. 8, pp. 30090-30098, Oct. 2016 (SCI, IF: 5.900)(*corresponding authors)
    H. Jeong J. W. Kim J. Park Jihwan An* T. Lee F. B. Prinz J. H. Shim*
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  • 기본썸네일이미지
    34
    PEALD YSZ-based bilayer electrolyte for thin film-solid oxide fuel cells
    Nanotechnology, Vol. 27, p. 415402, Sep. 2016 (SCI, IF: 3.573)(*corresponding authors)
    W. Yu G. Y. Cho S. Hong Y. Lee Y. B. Kim Jihwan An* S. W. Cha*
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  • Plasma-enhanced Atomic Layer Deposition of Barium Titanate with Aluminum Incorporation
    33
    Plasma-enhanced Atomic Layer Deposition of Barium Titanate with Aluminum Incorporation
    Acta Mater., Vol. 117, pp. 153-159, Sep. 2016 (DOI: 10.1016/j.actamat.2016.07.018)(SCI(top 10%), IF: 5.058)
    Y. Kim P. Schindler A. L. Dadlani S. Acharya J. Provine Jihwan An* F. B. Prinz
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